Thin film deposition capabilities

Multi-target KrF PLD system Multi-target KrF PLD system

Complex and high quality single and multilayer structures can be grown using our Pulsed Laser Deposition Facility (Lambda Physik LPX® 210i, KrF excimer laser) with dielectric rare mirror for 248 nm with a Neocera deposition chamber and 6-target.

These facilities include:

  • Multi-target KrF PLD system
  • DC magnetron sputter chamber
  • Digitally controlled Nd-YAG (yttrium aluminum garnet) laser cutter
  • Clean room with mask aligner
  • Computer controlled wafer saw
  • Dektak profilometer


Last modified on 20 May 2015