Facilities & Capabilities
The Zeiss 1540EsB is a multi-technique dual beam (electron and Ga ion) field emission Scanning Electron Microscope (SEM) with a spatial resolution for imaging of 1 nanometer (0.8 nm STEM).
This technique allows us to visualize the voltage change responses on local heating from low power diode laser at constant bias current at temperatures 3.7 K – 300 K with magnetic fields up to 5 tesla.
Magneto-optical imaging allows us to image and measure the local uniformity of current flow or magnetization in fields up to 0.15 T and temperatures down to ~6 K using the Faraday effect by applying an in-plane magnetized Bi-YIG imaging film to the sample surface and imaging using polarized light microscopy.
An extensive metallographic preparation laboratory allows preparation of complex structures with minimal polishing artifacts from initial diamond saw sectioning to final vibratory polishing.
Complex and high quality single and multilayer structures can be grown using our Pulsed Laser Deposition Facility (Lambda Physik LPX® 210i, KrF excimer laser) with dielectric rare mirror for 248 nm with a Neocera deposition chamber and 6-target.